DISK ELECTRODE IN THE PRESENCE OF THALLIUM ION

Authors
Citation
Km. Yin et Hj. Hong, DISK ELECTRODE IN THE PRESENCE OF THALLIUM ION, Transactions of the Institute of Metal Finishing, 75, 1997, pp. 35-38
Citations number
15
Categorie Soggetti
Metallurgy & Metallurigical Engineering","Materials Science, Coatings & Films
ISSN journal
00202967
Volume
75
Year of publication
1997
Part
1
Pages
35 - 38
Database
ISI
SICI code
0020-2967(1997)75:<35:DEITPO>2.0.ZU;2-#
Abstract
Ni-Fe-TiO2 composite coatings were electrodeposited potentiostatically on to a copper rotating disk electrode. The relationship between bulk TiO2 particle concentration and the amount included within the metal matrix was determined at different applied voltages. It was found that the mass flux of TiO2 increases in a solution of increased increased TiO2, concentration In the presence of a small concentration of Tl+, t he flux of TiO2 increases significantly compared to the bath without t hallium ion. Tl+ ion inhibits the iron deposition rate but enhances th e reduction of nickel; while the total deposition rate of metal (nicke l + iron) is decreased.