Cd. Liu et Mn. Bassim, CONFIGURATION OF LOOP PATCH AT LOW STRAIN AMPLITUDE IN POLYCRYSTALLINE COPPER, Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties, 70(4), 1994, pp. 591-605
The loop patch structure produced in polycrystalline copper, fatigued
at low strain amplitudes below the quasiplateau region of the cyclic s
tress strain curves, reveals three types of configuration: cylindrical
, irregular and cellular shapes. It is identified that the cylindrical
loop patches consist of edge dipolar debris with primary Burgers vect
or and are formed from the deposition of edge segments by sweeping scr
ew dislocations. The irregular loop patches are developed predominantl
y from stacking of two kinds of dislocation dipolar debris and loops i
n the grains oriented with double slip. The cellular loop patches are
formed from the interaction of four types of dislocation in the grain
oriented with multislip. In addition, cubic sessile dislocations are f
ound to coexist with the irregular loop patches and the cellular loop
patches. These cubic sessile dislocations are formed from the reaction
between edge dislocations and screw dislocations which are perpendicu
lar to each other. It is explained that all three types of structures
are low-energy dislocation configurations and can be modelled by the T
aylor lattice, the double Taylor lattice and the complex Taylor lattic
e respectively.