We study the efficiency of using multilayer structures as an etch-stop
mechanism in the ablation of polyimide films by ultraviolet lasers. T
he study is done using a photothermal model that includes the light ab
sorption by the decomposed fragments, which shield the polymer from th
e laser beam, an intermediate zone in which the polymer is suffering a
phase transition and the underlying unburned material. The layers are
differentiated from each other through the optical properties. Variat
ion in the optical properties of polyimide has been achieved by a prop
er selection of impurities. From our modeling work, we conclude that o
ptically thin foils may be used as etch stop in the ablation process w
hen the penetration depth of the middle layer is around three times la
rger than the penetration depth of the surrounding layers, this for fl
uences below 200 mJ/cm2. We also present some experimental results.