COMPARISON OF 2 METHODS FOR CORRECTING OCULAR ARTIFACTS IN EEGS

A major problem in the study of brain potentials is the occurrence of ocular artefacts in electro-encephalograms. OAs can be monitored by pl acing electrodes near the eyes and recording electro-oculograms. In th e paper, two OA correction methods based on simulations are compared; the Jervis method and the vandenBerg method. In most simulations, the residual (the difference between the original EEG and EEG after correc tion) is smaller in amplitude and variance for the vandenBerg method t han for the Jervis method. When eye movements and blinks are given dif ferent factors, the blinks are not removed completely. For both method s, the residual of the blinks and for eye movements. The occurrence of a slow negative wave greatly disturbs the estimated parameters and th us the residuals of the Jervis method. For the vandenBerg method, ther e is only a very small effect. The conclusion from correcting a record ed data set, which does not contain a slow negative wave, is that, for these data, there is no evidence that one method is better than the o ther.