Lg. Christophorou et al., PHOTODETACHMENT IN THE GASEOUS, LIQUID, AND SOLID STATES OF MATTER, The Journal of chemical physics, 101(8), 1994, pp. 6728-6742
We have made absolute cross section measurements of laser photodetachm
ent of C6F6- ions embedded in gaseous tetramethylsilane (TMS) and comp
ared the results at low gas densities with measurements in nonpolar li
quids and solids. The measurements indicate that the photodetachment c
ross section of C6F6- in gaseous TMS is about three times larger than
in liquid TMS. This is rationalized by considering the effect of the m
edium on both the photoabsorption and the autodetachment processes. Th
e photodetachment cross section in both the gas and the liquid exhibit
s (at least) two maxima due to autodetaching negative ion states. It i
s argued that these are due to sigma-->sigma* transitions in C6F6-. T
he relative positions of these ''superexcited'' anionic states did not
change appreciably in going from the gas to the liquid and the solid,
indicating similar influences of the medium on them. As expected, the
photodetachment threshold in the condensed phase is shifted to higher
energies compared to the gaseous phase. This shift is consistent with
recent photoelectron studies of photodetachment of C6F6- clusters. Th
e present study clearly shows that the photodetachment from negative i
ons embedded in all states of matter proceeds directly or indirectly v
ia negative ion autodetaching states, and that for nonpolar media, the
effect of the medium can be accounted for by considering the macrosco
pic properties of the medium described by its dielectric constant epsi
lon and refractive index n.