METAL VAPOR VACUUM-ARC ION SOURCES RADUGA

A brief review is presented of the ''Raduga'' 1-4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and fun ctional ranges are described. The Raduga ion sources provide single- a nd multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion specie s. Another feature of the ion sources is their ability to generate a s equence of ion beam and plasma stream pulses. Switching between ion ir radiation and plasma deposition can be done from pulse to pulse, withi n each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum a rc ion sources are described.