Epitaxial layers of AlAs1-xSbx have been prepared by metalorganic vapo
r phase deposition (MOCVD) in a horizontal, atmospheric-pressure quart
z reactor. The influences of the V/III ratio and the input partial pre
ssure of trimethylantimony were systematically studied. The experiment
al results are in good agreement with the calculated ones, based on th
ermodynamic considerations, which implies that the growth of AlAsSb in
MOCVD is controlled predominantly by thermodynamics.