Y. Okada et al., SILICATE ANION STRUCTURE AND DEHYDRATION PROCESSES OF OKENITE, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 102(10), 1994, pp. 919-924
The silicate anion structure and thermal decomposition behavior of oke
nite were studied mainly using solid Si-29 NMR. The silicate anion str
ucture of okenite is very close to some parts of the sheet structure o
f gyrolite. Dehydration occurs at around 119 and 315-degrees-C which a
re caused by the decomposition of the double-chain and sheet structure
, and the sheet structure, respectively. Although, the dehydration is
caused by the water in the interlayer of okenite, and the main silicat
e anion structure remains untill around 350-degrees-C. From 350 to 700
-degrees-C, the silicate anion structure decompose gradually as the te
mperature increases and many kinds of silicate anions are formed from
the double-chain and the sheet structure of okenite. By the thermal tr
eatment above 800-degrees-C, wollastonite, pseudo-wollastonite and amo
rphous silica are formed and pseudo-wollastonite, cristobalite, quartz
and silica glass are formed over 1200-degrees-C.