IN-SITU MEASUREMENT OF OPTICAL-ABSORPTION IN SILICA GLASS DURING THE IRRADIATION OF VACUUM-ULTRAVIOLET LIGHT

Authors
AWAZU K ONUKI H
Citation
K. Awazu et H. Onuki, IN-SITU MEASUREMENT OF OPTICAL-ABSORPTION IN SILICA GLASS DURING THE IRRADIATION OF VACUUM-ULTRAVIOLET LIGHT, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 102(10), 1994, pp. 961-965
Citations number
22
Categorie Soggetti
Material Science, Ceramics
Journal title
Nippon Seramikkusu Kyokai gakujutsu ronbunshi → ACNP
ISSN journal
09145400
Volume
102
Issue
10
Year of publication
1994
Pages
961 - 965
Database
ISI
SICI code
0914-5400(1994)102:10<961:IMOOIS>2.0.ZU;2-3
Abstract
In-situ measurements of optical absorption in silica glass were carrie d out under irradiation of VUV light using undulator radiation. Optica l loss at 6.7 eV and 7.6 eV increased with increasing of total dosage. It was also observed that the increase in the optical loss depends on the preparation method of silica glass. Optical loss caused by the VU V irradiation was restricted in silica glass having fluorine and OH gr oups.