A. Leone et al., HYDRODYNAMIC SIMULATION OF SEMICONDUCTOR-DEVICES OPERATING AT LOW-TEMPERATURE, IEEE transactions on computer-aided design of integrated circuits and systems, 13(11), 1994, pp. 1400-1408
The problems related to the hydrodynamic simulation of semiconductor d
evices operating at liquid nitrogen temperature are investigated, with
emphasis on the numerical aspects. A discretization strategy is propo
sed that allows one to incorporate in a conventional hydrodynamic prog
ram typical low-temperature effects, such as Fermi statistics and inco
mplete ionization, as well as proper boundary conditions. The suggeste
d technique has been implemented in the hydrodynamic version of the pr
ogram HFIELDS, and it has been tested by means of the simulation of a
submicron n-channel MOSFET.