SELECTIVE ABLATION OF A HYDROGENATED AMORPHOUS-SILICON THIN-LAYER BY THE 2ND-HARMONIC RADIATION OF A TRANSVERSELY EXCITED ATMOSPHERIC CO2-LASER

Authors
SUMIYOSHI T NINOMIYA Y SHIRATORI A OBARA M ISHII K
Citation
T. Sumiyoshi et al., SELECTIVE ABLATION OF A HYDROGENATED AMORPHOUS-SILICON THIN-LAYER BY THE 2ND-HARMONIC RADIATION OF A TRANSVERSELY EXCITED ATMOSPHERIC CO2-LASER, Applied physics letters, 65(17), 1994, pp. 2127-2129
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
65
Issue
17
Year of publication
1994
Pages
2127 - 2129
Database
ISI
SICI code
0003-6951(1994)65:17<2127:SAOAHA>2.0.ZU;2-Y
Abstract
The second-harmonic radiation of the transversely excited atmospheric CO2 laser generated by a AgGaSe2 nonlinear crystal is used for the sel ective ablation of a hydrogenated amorphous silicon (a-Si:H) thin laye r on a quartz substrate. The vibrational energy of the Si-H bonds cont ained in a-Si:H at 10 at. % coincides with the photon energy of the 5 mu m light and absorbed the laser photons to sufficiently ablate the l ayer without damage on the quartz substrate. (C) 1994 American Institu te of Physics.