W. Gao et al., IN0.53GA0.47AS METAL-SEMICONDUCTOR-METAL PHOTODIODES WITH TRANSPARENTCADMIUM TIN OXIDE SCHOTTKY CONTACTS, Applied physics letters, 65(15), 1994, pp. 1930-1932
A metal-semiconductor-metal (MSM) In0.53Ga0.47As photodiode using a tr
ansparent cadmium tin oxide (CTO) layer for the interdigitated electro
des was investigated. The transparent contact prevents shadowing of th
e active layer by the electrodes, thus allowing greater collection of
incident light. The barrier height (phiBn) of CTO on i-In0.52Al0.48As
was determined to be 0.47 eV, while the Ti/Au barrier height was 0.595
eV. The reduced barrier height for CTO is caused by tunneling through
the sputter-damaged cap layer. Responsivity for 1.3 mum incident ligh
t was 0.49 and 0.28 A/W, respectively, for the CTO and Ti/Au MSM photo
diodes. No antireflection (AR) coating was utilized over the bare semi
conductor surface. The CTO MSM photodiode shows a factor of almost two
improvement in responsivity over conventional Ti/Au MSM photodiodes.
(C) 1994 American Institute of Physics.