IN0.53GA0.47AS METAL-SEMICONDUCTOR-METAL PHOTODIODES WITH TRANSPARENTCADMIUM TIN OXIDE SCHOTTKY CONTACTS

Citation
W. Gao et al., IN0.53GA0.47AS METAL-SEMICONDUCTOR-METAL PHOTODIODES WITH TRANSPARENTCADMIUM TIN OXIDE SCHOTTKY CONTACTS, Applied physics letters, 65(15), 1994, pp. 1930-1932
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
65
Issue
15
Year of publication
1994
Pages
1930 - 1932
Database
ISI
SICI code
0003-6951(1994)65:15<1930:IMPWT>2.0.ZU;2-G
Abstract
A metal-semiconductor-metal (MSM) In0.53Ga0.47As photodiode using a tr ansparent cadmium tin oxide (CTO) layer for the interdigitated electro des was investigated. The transparent contact prevents shadowing of th e active layer by the electrodes, thus allowing greater collection of incident light. The barrier height (phiBn) of CTO on i-In0.52Al0.48As was determined to be 0.47 eV, while the Ti/Au barrier height was 0.595 eV. The reduced barrier height for CTO is caused by tunneling through the sputter-damaged cap layer. Responsivity for 1.3 mum incident ligh t was 0.49 and 0.28 A/W, respectively, for the CTO and Ti/Au MSM photo diodes. No antireflection (AR) coating was utilized over the bare semi conductor surface. The CTO MSM photodiode shows a factor of almost two improvement in responsivity over conventional Ti/Au MSM photodiodes. (C) 1994 American Institute of Physics.