METALLIC ION-IMPLANTATION BY USING A MEVVA ION-SOURCE

Metallic ions (Ti, Mo, W, V, Ni, Y, Fe and Al) extracted from a MEVVA source have been implanted up to high doses (> 1 x 10(17) cm-2) into A l and H13 steel. Because of beam heating, rather low energy ions could penetrate quite deeper in the substrates than predicted, stable inter metallic compounds appear as fine precipitates in the doped region, an d hence the retained concentration of implants even exceeds the sputte r-limited maximum. Multiply charged beam, enhanced diffusion and chemi cal reaction give great influences to the concentration distribution o f implants. All these features are strongly dependent on the chosen io n-target combination.