A novel technique of laser drilling of reinforced Teflon films with Si
O2 particles is demonstrated. The new process consists of three simple
steps. First, 300 Angstrom of gold is deposited on Teflon to allow la
ser absorption. Second, drilling is done by pulsed irradiation at a ra
te of one here per pulse. At this stage the Teflon is only modified by
the laser irradiation. Third, the modified Teflon is removed by ultra
sonic cleaning, leaving behind clean through-holes of 50 mu m in diame
ter. A potential drilling speed as high as 60000 holes/min with fairly
high spatial resolution is the main attraction of this simple techniq
ue.