V. Georgescu, MAGNETIC-PROPERTIES OF CO-NI-MG-N THIN-FILMS, Materials science & engineering. B, Solid-state materials for advanced technology, 27(1), 1994, pp. 17-21
The effect was investigated of nitrogen content on the magnetic proper
ties (B-s, H-c, B-r/B-s), microhardness H-V and microstructure of Co-N
i-Mg-N thin films (450 nm) in the composition range 0-16 at.% N, 82-66
at.% Co, 4 at.% Mg, balance Ni. The films were electroplated onto an
Al substrate with a 50 nm Ni buffer layer. They are of practical use a
s longitudinal recording media (H-c=70 kA m(-1), B-r/B-s=0.95-0.98, H-
V=19.5x10(8) Pa, for films containing 8-10 at.% N).