PHOTOEMISSION OPTOGALVANIC STUDIES WITH COPPER AS TARGET ELECTRODE

Authors
AJITHPRASAD KC NAMPOORI VPN VALLABHAN CPG
Citation
Kc. Ajithprasad et al., PHOTOEMISSION OPTOGALVANIC STUDIES WITH COPPER AS TARGET ELECTRODE, Applied surface science, 103(4), 1996, pp. 465-470
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
103
Issue
4
Year of publication
1996
Pages
465 - 470
Database
ISI
SICI code
0169-4332(1996)103:4<465:POSWCA>2.0.ZU;2-7
Abstract
Photoemission optogalvanaic (FOG) effect has been observed by irradiat ing copper target electrode, in a nitrogen discharge cell using 1.06 m u m and frequency doubled 532 nm Nd:YAG laser pulse. Measurement of th e nature of the variation of FOG signal strength with 532 nm laser flu ence confirms the two photon induced photoelectric emission from coppe r. However, using 1.06 mu m laser pulses thermally assisted photoemiss ion is observed.