P. Wetzel et al., SURFACE-STATES AND RECONSTRUCTION OF EPITAXIAL ROOT-3-X-ROOT-3R 30-DEGREES ER SILICIDE ON SI(111), Physical review. B, Condensed matter, 50(15), 1994, pp. 10886-10892
The surface electronic structure of epitaxial root 3 X root 3R 30 degr
ees ErSi1.7 layers on Si(111) has been studied by high-resolution angl
e-resolved ultraviolet photoemission spectroscopy. Typical surface sta
tes or resonances are unambiguously identified and their band dispersi
ons mapped along the high-symmetry Gamma ($) over bar M ($) over bar G
amma ($) over bar K ($) over bar, and K ($) over bar M ($) over bar li
nes of the (1 X 1) surface Brillouin zone. These data are compared to
the band structure of two-dimensional p(1 X 1) Er silicide extensively
studied in previous works. It is found that the prominent surface ban
ds observed in the 0-3-eV binding-energy range can be readily derived
from the p(1 X 1) surface-silicide bands folded back into the reduced
root 3 X root 3 zone. This indicates that the bulk silicide is also te
rminated with a buckled Si layer without vacancies, quite similar to t
he surface-silicide termination. In particular, specific surface bands
reflect the doubly (essentially) occupied dangling bonds and the back
bonds of the buckled Si top layer.