STRUCTURE AND MICROSTRUCTURE OF ION-PLATED TITANIUM FILMS

In the present study the properties of ion-plated titanium films have been investigated for their structure and microstructure. It has been found that the crystalline orientation of the films is a strong functi on of process parameters such as the rate of deposition, ion flux and bias voltage. The stress exhibits a transition from tensile to compres sive with increase in ion bombardment. It has also been found that the lattice parameter increases initially and then decreases with increas e in ion bombardment. Finally, the microstructure of the films shows t hat they densify with increase in ion bombardment. A correlation betwe en the mechanisms governing the process and the film properties has al so been made.