V. Maurice et al., XPS AND STM INVESTIGATION OF THE PASSIVE FILM FORMED ON CR(110) SINGLE-CRYSTAL SURFACES, Journal of the Electrochemical Society, 141(11), 1994, pp. 3016-3027
A combined ex situ x-ray photoelectron spectroscopy (XPS) and scanning
tunneling microscopy (STM) investigation of the passive films formed
on Cr(110) single-crystal surfaces in 0.5M H2SO4 is reported. The comp
osition, thickness, and structure of the passive films were studied as
a function of polarization time and potential in the passive region.
XPS measurements evidence the formation of a hydroxide layer of trival
ent chromium in the outer part of the film, and of a layer of oxide of
trivalent chromium in the inner part. Some amount of oxyhydroxide may
be present in the inner part of the film. Aging of the passive film u
nder polarization is critical for the development of the oxide inner p
art. The surface topography, assigned to the hydroxide layer, is chara
cterized by disordered protrusions of 1 to 4 nm lateral dimensions and
4 to 8 angstrom vertical dimensions. Ordered domains of limited exten
sion (less-than-or-equal-to 3 nm), assigned to chromium oxide, are det
ected, showing the nanocrystalline character of the inner part of the
passive film. These nanocrystals are separated by areas in which no or
der could be found on the surface and where no crystalline defects cou
ld be detected. The relationship between the measured structure of the
passive film and the resistance to breakdown is discussed.