XPS AND STM INVESTIGATION OF THE PASSIVE FILM FORMED ON CR(110) SINGLE-CRYSTAL SURFACES

Citation
V. Maurice et al., XPS AND STM INVESTIGATION OF THE PASSIVE FILM FORMED ON CR(110) SINGLE-CRYSTAL SURFACES, Journal of the Electrochemical Society, 141(11), 1994, pp. 3016-3027
Citations number
29
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
141
Issue
11
Year of publication
1994
Pages
3016 - 3027
Database
ISI
SICI code
0013-4651(1994)141:11<3016:XASIOT>2.0.ZU;2-R
Abstract
A combined ex situ x-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM) investigation of the passive films formed on Cr(110) single-crystal surfaces in 0.5M H2SO4 is reported. The comp osition, thickness, and structure of the passive films were studied as a function of polarization time and potential in the passive region. XPS measurements evidence the formation of a hydroxide layer of trival ent chromium in the outer part of the film, and of a layer of oxide of trivalent chromium in the inner part. Some amount of oxyhydroxide may be present in the inner part of the film. Aging of the passive film u nder polarization is critical for the development of the oxide inner p art. The surface topography, assigned to the hydroxide layer, is chara cterized by disordered protrusions of 1 to 4 nm lateral dimensions and 4 to 8 angstrom vertical dimensions. Ordered domains of limited exten sion (less-than-or-equal-to 3 nm), assigned to chromium oxide, are det ected, showing the nanocrystalline character of the inner part of the passive film. These nanocrystals are separated by areas in which no or der could be found on the surface and where no crystalline defects cou ld be detected. The relationship between the measured structure of the passive film and the resistance to breakdown is discussed.