AN ADVANCED IC PROCESSING LABORATORY AT THE UNIVERSITY-OF-NOTRE-DAME

Citation
Gh. Bernstein et al., AN ADVANCED IC PROCESSING LABORATORY AT THE UNIVERSITY-OF-NOTRE-DAME, IEEE transactions on education, 37(4), 1994, pp. 334-340
Citations number
14
Categorie Soggetti
Engineering, Eletrical & Electronic","Education, Scientific Disciplines
ISSN journal
00189359
Volume
37
Issue
4
Year of publication
1994
Pages
334 - 340
Database
ISI
SICI code
0018-9359(1994)37:4<334:AAIPLA>2.0.ZU;2-D
Abstract
A new integrated circuits fabrication laboratory course was developed at the University of Notre Dame. The course was taught first to gradua te students, who helped to develop the processes, and then to seniors. Complementary metal oxide semiconductor (CMOS) test circuits of up to 150 transistors per circuit, with 5-micron minimum geometries on 4-in ch wafers were successfully fabricated. In this paper we discuss the c onstruction, funding, and operation of the facility in which the cours e is taught. We also discuss the fabrication process used by the stude nts, class assignments, and results of the first semester in which the course was offered to seniors.