We report metalorganic vapor phase epitaxy growth of InAs0.66P0.34/InP
/In0.74Ga0.26P strain compensated multiple quantum wells (MQWs) at 1.5
mum wavelength. A composite InP/InGaP/InP barrier structure is used t
o tune the net strain of the MQWs. Compared with InAs0.66P0.34/InP str
ained MQWs grown under similar conditions, the InAs0.66P0.34/InP/In0.7
4Ga0.26P strain compensated MQWs show improvement in crystalline and o
ptical quality. (C) 1994 American Institute of Physics.