P. Thomsenschmidt et al., CHARACTERIZATION AND DEPOSITION OF OXIDE-FILMS BY LASER-ASSISTED ELECTRON-BEAM EVAPORATION (LEBE) FOR OPTICAL APPLICATIONS, Physica status solidi. a, Applied research, 145(2), 1994, pp. 453-460
In the laser assisted electron beam evaporation (LEBE) a fused silica
substrate is heated by cw CO2 laser irradiation before and during film
condensation. HfO2 and Y2O3 films are prepared with this technique. T
he optical and structural properties of the coatings are investigated
by spectral-photometric transmission measurement (refractive index), l
aterally resolved ellipsometry (lateral index and thickness profile ca
lculations), and X-ray diffraction (structure). The surface morphology
is characterized by lateral force microscopy, a special mode of atomi
c force microscopy. Laser damage threshold values are also studied at
248 nm. It is observed that the LEBE deposited films have a rough colu
mnar, crystalline structure and increased refractive index and laser d
amage threshold values in comparison to amorphous films prepared by co
nventional EBE.