MONTE-CARLO SIMULATION OF INP AND GAAS-MESFETS

Citation
Gm. Dunn et al., MONTE-CARLO SIMULATION OF INP AND GAAS-MESFETS, Semiconductor science and technology, 9(11), 1994, pp. 2123-2129
Citations number
22
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
9
Issue
11
Year of publication
1994
Pages
2123 - 2129
Database
ISI
SICI code
0268-1242(1994)9:11<2123:MSOIAG>2.0.ZU;2-2
Abstract
We have performed Monte Carlo simulations of InP MESFETs of lengths 0. 6, 0.9 and 1.2 mu m and compared these results with those on GaAs MESF ETs of the same dimensions. The direct current IV characteristics of t he two materials were found to be similar though the GaAs characterist ics were on the whole superior, reaching their operating point at lowe r drain voltages and possessing higher gains. However, oscillations in the drain current caused by changes in drain voltage in the GaAs devi ces were not present to the same degree in the InP devices. This diffe rence is caused partially by the onset of the negative differential re gime in InP at a higher electric field than in GaAs but the primary ca use is the longer ballistic transport times in InP. This suggests that InP MESFETS may prove to have superior frequency response characteris tics than GaAs MESFETs.