SUPER-HARD CUBIC BN LAYER FORMATION BY NITROGEN ION-IMPLANTATION

Citation
Ff. Komarov et al., SUPER-HARD CUBIC BN LAYER FORMATION BY NITROGEN ION-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 94(3), 1994, pp. 237-239
Citations number
4
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
94
Issue
3
Year of publication
1994
Pages
237 - 239
Database
ISI
SICI code
0168-583X(1994)94:3<237:SCBLFB>2.0.ZU;2-D
Abstract
Microcrystalline and amorphous boron thin films were implanted with ni trogen ions at energies from 25 to 125 keV and with doses from 2 X 10( 17) to 1 X 10(18) at./cm(2) at temperatures below 200 degrees C. The s tructure of boron nitride phases after ion implantation, formation of phases and phase transformations were investigated by TEM and TED meth ods. The cubic boron nitride phase is revealed. The microhardness of t he formed films was satisfactorily explained in terms of chemical comp ound formation by polyenergetic ion implantation. The influence of the copper impurity on the formation of the cubic boron nitride phase is demonstrated. It has also been shown that low concentrations of copper promote cubic BN boundary formation.