STRUCTURAL-ANALYSIS OF ELECTROLESS DEPOSITS IN THE DIFFUSION-LIMITED REGIME

Citation
A. Kuhn et al., STRUCTURAL-ANALYSIS OF ELECTROLESS DEPOSITS IN THE DIFFUSION-LIMITED REGIME, Physical review letters, 73(22), 1994, pp. 2998-3001
Citations number
33
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
73
Issue
22
Year of publication
1994
Pages
2998 - 3001
Database
ISI
SICI code
0031-9007(1994)73:22<2998:SOEDIT>2.0.ZU;2-4
Abstract
We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). We show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to provide a comparative structural characteriza tion of both experimental electroless deposits and numerical DLA clust ers.