We discuss the actual relevance of thin gap geometry electrodeposition
to generate fractal patterns that mimic the morphology of Witten and
Sander's diffusion-limited aggregates (DLA). We show that electroless
deposition is a good candidate to meet the requirements for diffusion
to be the rate limiting step of the growth process. We use the wavelet
transform microscope to provide a comparative structural characteriza
tion of both experimental electroless deposits and numerical DLA clust
ers.