STRUCTURAL-ANALYSIS OF ELECTROLESS DEPOSITS IN THE DIFFUSION-LIMITED REGIME

We discuss the actual relevance of thin gap geometry electrodeposition to generate fractal patterns that mimic the morphology of Witten and Sander's diffusion-limited aggregates (DLA). We show that electroless deposition is a good candidate to meet the requirements for diffusion to be the rate limiting step of the growth process. We use the wavelet transform microscope to provide a comparative structural characteriza tion of both experimental electroless deposits and numerical DLA clust ers.