STREHL RATIO VERSUS DEFOCUS FOR NONCENTRALLY OBSCURED PUPILS

Citation
J. Ojedacastaneda et al., STREHL RATIO VERSUS DEFOCUS FOR NONCENTRALLY OBSCURED PUPILS, Applied optics, 33(32), 1994, pp. 7611-7616
Citations number
10
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
33
Issue
32
Year of publication
1994
Pages
7611 - 7616
Database
ISI
SICI code
0003-6935(1994)33:32<7611:SRVDFN>2.0.ZU;2-J
Abstract
We discuss from the viewpoint of the Strehl ratio versus defocus, or t he normalized axial-irradiance distribution, the influence of decenter ing the dark mask of an annular pupil. Our treatment, which is valid f or pupil apertures with any Fresnel number, permits us to infer that t he axial behavior of a noncentrally obscured pupil is equivalent to th at of an apodizer with continuous amplitude variations. Hence the Stre hl ratio versus defocus of an optical system can be shaped by use of n oncentered dark masks that act as continuous gray apodizers. Several n umerically evaluated examples are presented.