MOLECULAR-BEAM HOMOEPITAXIAL GROWTH OF MGO(001)

Citation
Sa. Chambers et al., MOLECULAR-BEAM HOMOEPITAXIAL GROWTH OF MGO(001), Journal of materials research, 9(11), 1994, pp. 2944-2952
Citations number
26
Categorie Soggetti
Material Science
ISSN journal
08842914
Volume
9
Issue
11
Year of publication
1994
Pages
2944 - 2952
Database
ISI
SICI code
0884-2914(1994)9:11<2944:MHGOM>2.0.ZU;2-J
Abstract
We describe homoepitaxial growth and detailed in situ characterization of MgO(001). We have used, for the first time, high-speed Auger elect ron spectroscopy as a real-time probe of film composition during growt h. Excellent short-range and long-range crystallographic order are ach ieved in films grown to a thickness of several hundred angstroms in th e substrate temperature range of 450 degrees C to 750 degrees C. Moreo ver, the films become more laminar as the growth temperature increases , suggesting that MgO grows homoepitaxially by the step-flow growth me chanism at elevated temperature. The surfaces of films grown at 650 de grees and 750 degrees C are smoother than those obtained by cleaving M gO(001).