A METHOD TO CONFINE THIN SOLID ORGANIC FILMS BETWEEN FLAT RIGID WALLS

A procedure for the vapor deposition of a thick layer of silicon oxide was developed to confine thin polymer films between two rigid flat wa lls. For silicon oxide overlayers thicker than approximately 1.5 mum t he deposited silicon oxide layer is mechanically stable against heatin g above the glass transition temperature of the polymer. Neutron refle ctivity measurements show that the interface between the polymer and t he deposited silicon oxide is sharp, having a characteristic width of 1.5 nm.