M. Wojtowicz et al., 0.10-MU-M GRADED INGAAS CHANNEL INP HEMT WITH 305-GHZ FT AND 340-GHZ FMAX, IEEE electron device letters, 15(11), 1994, pp. 477-479
We report here 305 GHz f(T), 340 GHz f(max), and 1550 mS/mm extrinsic
g(m) from a 0.10 mum In(x)Ga1-xAs/In0.52Al0.48As/InP HEMT with x grade
d from 0.60 to 0.80. This device has the highest f(T) yet reported for
a 0.10 mum gate length and the highest combination of f(T) and f(max)
reported for any three-terminal device. This performance is achieved
by using a graded-channel design which simultaneously increases the ef
fective indium composition of the channel while optimizing channel thi
ckness.