AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF SILVER, PALLADIUM AND METAL ALLOY (AG1-XPDX, AG1-XCUX AND PD1-XCUX) FILMS

Authors
XU CY HAMPDENSMITH MJ KODAS TT
Citation
Cy. Xu et al., AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF SILVER, PALLADIUM AND METAL ALLOY (AG1-XPDX, AG1-XCUX AND PD1-XCUX) FILMS, Advanced materials, 6(10), 1994, pp. 746-748
Citations number
22
Categorie Soggetti
Material Science
Journal title
Advanced materials → ACNP
ISSN journal
09359648
Volume
6
Issue
10
Year of publication
1994
Pages
746 - 748
Database
ISI
SICI code
0935-9648(1994)6:10<746:AC(OSP>2.0.ZU;2-K
Abstract
Thermally labile, low-volatility molecules are usually unsuitable as p recursors for the chemical vapor deposition of high-quality metal film s. Here, a new method, aerosol-assisted CVD (see Fig.), is reported, a nd used to produce crystalline silver, palladium, and binary metal all oy thin films from just such precursors.