OPTICAL-PROPERTIES OF LITHIUM-INTERCALATED V2O5-BASED FILMS TREATED IN CF4 GAS

Citation
A. Talledo et al., OPTICAL-PROPERTIES OF LITHIUM-INTERCALATED V2O5-BASED FILMS TREATED IN CF4 GAS, Applied physics letters, 65(22), 1994, pp. 2774-2776
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
65
Issue
22
Year of publication
1994
Pages
2774 - 2776
Database
ISI
SICI code
0003-6951(1994)65:22<2774:OOLVFT>2.0.ZU;2-P
Abstract
Fluorocarbon-doped vanadium pentoxide films were produced by dc magnet ron sputtering in Ar+O-2+CF4 followed by annealing in the same gas. Th e films served as excellent hosts for galvanostatic and potentiodynami c lithiation. The luminous transmittance was improved by the doping. L ithium intercalation changes the optical band gap and the electrochemi cal performance in a manner that could be understood from a simple ban d structure model. (C) 1994 American Institute of Physics.