EFFECT OF GAS-COMPOSITION ON TEXTURE OF DIAMOND FILMS

Textured diamond films have been deposited on single-crystal silicon s ubstrates by microwave plasma-enhanced chemical vapor deposition. Seve ral unconventional gas mixtures (CO2-CH4, CO2-C2H6, and CO2-C2H4) were used in order to study the texturing formation within the diamond sta bility region in the C-O-H phase diagram. Optical emission spectroscop y was used to monitor the compositional dependence of the plasma emiss ion. The obtained diamond films were characterized by scanning electro n microscopy and x-ray diffraction. Diamond films deposited with all, the gas mixtures showed very similar surface morphologies and (100) te xturing was achieved only within a very narrow compositional range. Fi nally, a correlation was found between texturing conditions and CPI an d Ct line intensities in the plasma emission spectra. (C) 1994 America n Institute of Physics.