Sd. Ganichev et al., DIRECT TUNNEL IONIZATION OF DEEP IMPURITIES IN THE ELECTRIC-FIELD OF FAR-INFRARED RADIATION, Solid state communications, 92(11), 1994, pp. 883-887
Ionization of semiconductor deep impurity centers has been observed in
tile far infrared where photon energies are several factors of tall s
maller than the binding energy of the impurities. It is shown that the
ionization is caused at high intensities by direct tunnel ionization
in tile electric field of the high power radiation. This optical metho
d allows tile investigation of die tunnelling process at electric bias
fields well below the threshold of avalanche breakdown.