The magnetic anisotropy of Ni films grown on single-crystal Cu(100) wa
s studied in situ using the surface magneto-optic Kerr effect. The eas
y axis of magnetization lies in the plane of the film for ultrathin fi
lms and it is perpendicular to the film above a switching thickness. T
his behavior is attributed to a specific contribution to the magnetocr
ystalline anisotropy energy induced by a change in the film microstruc
ture above a critical thickness. In the Ni/Cu(100) system, the magneto
elastic interface anisotropy favors perpendicular magnetization which
becomes comparable to the shape anisotropy at the switching thickness.
We compare the switching thickness and magnetization of films grown u
sing different processing conditions.