VERTICAL INHOMOGENEITY OF THE MAGNETIZATION REVERSAL IN ANTIFERROMAGNETICALLY COUPLED CO CU MULTILAYERS AT THE FIRST MAXIMUM/

Magnetization behavior in antiferromagnetically (AFM) coupled multilay er systems was calculated by using an atomic layer model. Comparisons with the experimental results obtained on sputtered Co/Cu multilayers reveal remarkable differences in the magnetization reversal and in the field dependence of the magnetoresistance. Kerr loops measured from b oth sides of the stack display strong vertical differences. At the low er side near the Fe seed layer the magnetization reversal is in good a greement with that of our calculations whereas near the surface in lar ge portions of the stack the AFM coupling is destroyed or varied. Thes e effects are presumably caused by magnetic short circuits at defects in the multilayer structure. Cross-section transmission electron micro scopy reveals growth defects which seem to be responsible for the devi ations from the calculated ideal behavior.