MAGNETIC AND STRUCTURAL STUDIES OF SPUTTERED CO CU MULTILAYER FILMS/

Citation
Jd. Kim et al., MAGNETIC AND STRUCTURAL STUDIES OF SPUTTERED CO CU MULTILAYER FILMS/, Journal of applied physics, 76(10), 1994, pp. 6513-6515
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
10
Year of publication
1994
Part
2
Pages
6513 - 6515
Database
ISI
SICI code
0021-8979(1994)76:10<6513:MASSOS>2.0.ZU;2-O
Abstract
The structure and magnetic properties of sputtered Co/Cu multilayer fi lms with various layer thicknesses have been studied. X-ray diffractom etry and high resolution electron microscopy show the films to be poly crystalline with a fee structure and strong [111] texture in the growt h direction. The magnetoresistance (MR) of the films depends criticall y on Cu layer thickness (t(Cu)), with maximum values for films with t( Cu) around 1 nm. Large differences in saturating field are seen for fi lms with t(Cu) and t(Co) differing by a nominal 0.1 nm. The magnetic d omain structure, studied using Lorentz microscopy, shows strong depend ence on t(Cu). High MR-value films showed evidence of antiphase magnet ic domain boundaries. The high MR samples show antiferromagnetic coupl ing, with higher saturating fields than seen in the ferromagnetically coupled films.