GIANT MAGNETORESISTANCE PEAKS IN CONICU CU MULTILAYERS GROWN BY ELECTRODEPOSITION/

Citation
Sz. Hua et al., GIANT MAGNETORESISTANCE PEAKS IN CONICU CU MULTILAYERS GROWN BY ELECTRODEPOSITION/, Journal of applied physics, 76(10), 1994, pp. 6519-6521
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
10
Year of publication
1994
Part
2
Pages
6519 - 6521
Database
ISI
SICI code
0021-8979(1994)76:10<6519:GMPICC>2.0.ZU;2-7
Abstract
Giant magnetoresistance (GMR) of CoNiCu/Cu multilayers grown by electr odeposition was measured as a function of the copper layer thickness a nd effects of the order of 14% were obtained. The copper layer thickne ss ranged from 0.7 to 3.5 nm. Two peaks in the magnetoresistance were observed. One was centered at a copper thickness of similar to 1.0 nm and the second was centered at similar to 2.3 nm. Comparison of the fi eld dependence of the magnetoresistance with the field dependence of t he magnetization, as determined by vibrating-sample magnetometer, sugg ests that the saturation field for GMR and the magnetization are simil ar for the larger copper thicknesses, but are strikingly different nea r 1.0 nm copper thickness. This observation suggests that the GMR is a ffected by different factors depending on the thickness of the copper layer.