GIANT MAGNETORESISTANCE IN CO CU MULTILAYERS AFTER ANNEALING/

Authors
MCGUIRE TR HARPER JM CABRAL C PLASKETT TS
Citation
Tr. Mcguire et al., GIANT MAGNETORESISTANCE IN CO CU MULTILAYERS AFTER ANNEALING/, Journal of applied physics, 76(10), 1994, pp. 6601-6603
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
76
Issue
10
Year of publication
1994
Part
2
Pages
6601 - 6603
Database
ISI
SICI code
0021-8979(1994)76:10<6601:GMICCM>2.0.ZU;2-C
Abstract
Multilayer films of [Co 10 Angstrom/Cu(t)](64) with copper thicknesses from t=10 to 29 Angstrom annealed for 1 h at temperatures about 350 d egrees C showed a decrease in sample resistivity at 4.2 K. The giant m agnetoresistance (GMR) maximums for as-deposited films at t=10 Angstro m and t=23 Angstrom shifted with annealing. The GMR decreased for t=23 Angstrom but increased for t=19 Angstrom and t=29 Angstrom indicating a complex behavior with annealing. Similarities with granular films a re discussed.