A GaAs/AlAs resonant tunnelling diode (RTD) is incorporated in a 1 mum
thick membrane and used as a pressure sensor. The fabrication technol
ogy of the membrane is based upon the selective etch of GaAs with AlAs
as an etch stop layer. An external pressure introduces stress in the
layers of the RTD and modifies the position of the conduction band, th
e value of the effective mass and the Fermi level. These variations wi
ll change the peak current and voltage of the RTD. Measurements at roo
m temperature show that the effect of an applied pressure on a symmetr
ic RTD is asymmetric. This asymmetric is explained theoretically by th
e difference in the sign of the stress between the top and bottom laye
rs of the RTD.