The technology of microbridges preparation was developed on 7Ba(2)Cu(3
)O(7-d) epitaxial thin films. The optical lithography was used with th
e positive resist SCR 15. H3PO4 (85 %) acid diluted in ratio 1:300 was
used for etching. To reach the resolution of approximate to 1 mu m, a
n original process based on NaOH, as an etching interrupting agent was
developed.