MAGNETIC AND MAGNETOELASTIC PROPERTIES OF AMORPHOUS FE-SI-B-C FILMS

We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by R.F. sputter deposition. The films were d eposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm(2). Compositions were measured by electron probe micro-analysis (EPMA) and found to be similar to the t arget material at pressures of 20 mTorr. This pressure also gave the m inimum coercivity and minimum stress corresponding to a transition fro m compressive to tensile stress. All films exhibited in-plane anisotro py, the origin of which is the stray induction from the target magnetr on magnets.