LOCAL-STRUCTURE OF A COPPER SURFACE CHLORINATED AT A LOW-TEMPERATURE

Using a chlorination reaction of copper, the possibility of the applic ation of the electron energy loss fine structure (EELFS) technique for the determination of the local structure of the formed chloride film was shown. The intense extended fine structure above the Cl L2,3-edge detected in thin CuCl films permitted to obtain the nearest neighbors distance Cl-Cu which was equal to 2.32 +/- 0.03 angstrom. This value i s in good agreement with the corresponding one for bulk CuCl.