Wl. Chen et al., HOT-CARRIER EFFECTS ON INTERFACE-TRAP CAPTURE CROSS-SECTIONS IN MOSFETS AS STUDIED BY CHARGE PUMPING, IEEE electron device letters, 13(4), 1992, pp. 201-202
A rapid charge-pumping method was used to measure the interface-trap p
arameters in MOSFET's. The geometric mean of the electron and hole int
erface-trap capture cross sections decreases significantly (as much as
two orders of magnitude) after Fowler-Nordheim (F-N) injection, and g
radually recovers toward its original value. This effect is consistent
with the interface-trap transformation process observed in MOS capaci
tors.