TITANIUM MONONITRIDE AS AN ANTIREFLECTION LAYER ON ALUMINUM METALLIZATION FOR SUBMICRON PHOTOLITHOGRAPHIC PATTERNING

Authors
LOONG WA CHIU KD
Citation
Wa. Loong et Kd. Chiu, TITANIUM MONONITRIDE AS AN ANTIREFLECTION LAYER ON ALUMINUM METALLIZATION FOR SUBMICRON PHOTOLITHOGRAPHIC PATTERNING, Semiconductor science and technology, 6(12), 1991, pp. 1170-1174
Citations number
6
Journal title
Semiconductor science and technology → ACNP
ISSN journal
02681242
Volume
6
Issue
12
Year of publication
1991
Pages
1170 - 1174
Database
ISI
SICI code
0268-1242(1991)6:12<1170:TMAAAL>2.0.ZU;2-U