PROCESS PARAMETERS OPTIMIZATION FOR LASER DEPOSITION OF HIGH-TC SUPERCONDUCTING THIN-FILMS ON SI AND OTHER SUBSTRATE MATERIALS

Authors
VISPUTE RD BENDRE ST VISWANATHAN R CHAUDHARI SM KANETKAR SM OGALE SB
Citation
Rd. Vispute et al., PROCESS PARAMETERS OPTIMIZATION FOR LASER DEPOSITION OF HIGH-TC SUPERCONDUCTING THIN-FILMS ON SI AND OTHER SUBSTRATE MATERIALS, Bulletin of Materials Science, 14(2), 1991, pp. 443-449
Citations number
8
Journal title
Bulletin of Materials Science → ACNP
ISSN journal
02504707
Volume
14
Issue
2
Year of publication
1991
Pages
443 - 449
Database
ISI
SICI code
0250-4707(1991)14:2<443:PPOFLD>2.0.ZU;2-R