SIDEWALL ROUGHNESS DURING DRY ETCHING OF INP

Authors
CHAKRABARTI UK PEARTON SJ REN F
Citation
Uk. Chakrabarti et al., SIDEWALL ROUGHNESS DURING DRY ETCHING OF INP, Semiconductor science and technology, 6(5), 1991, pp. 408-410
Citations number
7
Journal title
Semiconductor science and technology → ACNP
ISSN journal
02681242
Volume
6
Issue
5
Year of publication
1991
Pages
408 - 410
Database
ISI
SICI code
0268-1242(1991)6:5<408:SRDDEO>2.0.ZU;2-8