STRESS CHARACTERIZATION OF RF-SPUTTERED AL2O3

Authors
CHRISTOVA K SZEKERES A
Citation
K. Christova et A. Szekeres, STRESS CHARACTERIZATION OF RF-SPUTTERED AL2O3, Semiconductor science and technology, 6(8), 1991, pp. 748-751
Citations number
16
Journal title
Semiconductor science and technology → ACNP
ISSN journal
02681242
Volume
6
Issue
8
Year of publication
1991
Pages
748 - 751
Database
ISI
SICI code
0268-1242(1991)6:8<748:SCORA>2.0.ZU;2-I