Tm. Dipalma et al., STUDIES ON NITRIDATION OF LASER EVAPORATED III-IV GROUP ELEMENTS WITHGASEOUS AMMONIA AND THIN-FILM DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 122(3), 1997, pp. 415-419
Groups In and IV nitrides have been viewed as promising materials in m
any technological applications, mostly in electronic devices and in ce
ramic materials. Many techniques such as CVD and MBE have been used to
grow nitride thin films. A method to prepare nitrides by adding gaseo
us ammonia to laser evaporated elements has been developed in our labo
ratory. B, In, Si and Ge nitrides have been prepared by this method. T
he intermediate steps in nitride production have been examined by opti
cal emission measurements and by mass spectrometry of the gas phase. T
he final products of the reaction have been characterized on various s
ubstrate surfaces by conventional techniques such as SEM, XRD and IR.