STUDIES ON NITRIDATION OF LASER EVAPORATED III-IV GROUP ELEMENTS WITHGASEOUS AMMONIA AND THIN-FILM DEPOSITION

Citation
Tm. Dipalma et al., STUDIES ON NITRIDATION OF LASER EVAPORATED III-IV GROUP ELEMENTS WITHGASEOUS AMMONIA AND THIN-FILM DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 122(3), 1997, pp. 415-419
Citations number
16
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
122
Issue
3
Year of publication
1997
Pages
415 - 419
Database
ISI
SICI code
0168-583X(1997)122:3<415:SONOLE>2.0.ZU;2-P
Abstract
Groups In and IV nitrides have been viewed as promising materials in m any technological applications, mostly in electronic devices and in ce ramic materials. Many techniques such as CVD and MBE have been used to grow nitride thin films. A method to prepare nitrides by adding gaseo us ammonia to laser evaporated elements has been developed in our labo ratory. B, In, Si and Ge nitrides have been prepared by this method. T he intermediate steps in nitride production have been examined by opti cal emission measurements and by mass spectrometry of the gas phase. T he final products of the reaction have been characterized on various s ubstrate surfaces by conventional techniques such as SEM, XRD and IR.