CARBON NITRIDE FILMS SYNTHESIZED BY DUAL-ION BEAM SPUTTERING

Carbon nitride films CN, have been obtained in a dual ion beam sputter ing system using Ar+ to deposite graphite and low energy(i.e. < 100 eV ) N-2(+)-ions to irradiate the film during its growth. The films have been characterized by Fourier transform infrared spectroscopy (FTIR), transmission electron microscopy (TEM) and X-ray photoelectron spectro scopy (XPS), The results indicate the formation of small crystallites of beta-C3N4 (similar to 20 nm) embedded in a polymer-like CNx amorpho us layer. Both, the nitrogen content and the formation of different C- N bonds is observed to depend on the energy and current density of the N-2(+) ions used to assist the deposition, In the present work we rep ort on films with a nitrogen content close to 45 at% as estimated from the infrared spectra.