RATE-CONSTANT AND PROBABILITY OF INTERACTION OF ATOMIC OXYGEN WITH POLYIMIDE FILMS

Authors
KUVALDINA EV LYUBIMOV VK RYBKIN VV
Citation
Ev. Kuvaldina et al., RATE-CONSTANT AND PROBABILITY OF INTERACTION OF ATOMIC OXYGEN WITH POLYIMIDE FILMS, High energy chemistry, 26(5), 1992, pp. 387-390
Citations number
11
Journal title
High energy chemistry → ACNP
ISSN journal
00181439
Volume
26
Issue
5
Year of publication
1992
Pages
387 - 390
Database
ISI
SICI code
0018-1439(1992)26:5<387:RAPOIO>2.0.ZU;2-A
Abstract
The etching of polyimide films in the afterglow of oxygen plasmas is s tudied. The rates of etching product formation and mass loss are measu red. It is shown that the etching rate is determined only by the densi ty of O(3P). The temperature variations of the rate and of the rate co nstant and probability of interaction of O(3P) with the polyimide are obtained..